MOHAMED, N. M.; KIN YIN, C. Preparation and Surface Analysis of Ultrathin Photoresist for Microlithography. Malaysian Journal of Science, [S. l.], v. 21, p. 141–146, 2002. Disponível em: https://malindojournal.um.edu.my/index.php/MJS/article/view/8877. Acesso em: 15 nov. 2024.